The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2025
Filed:
Jun. 08, 2023
Asml Netherlands B.v., Veldhoven, NL;
Yongfa Fan, Sunnyvale, CA (US);
Leiwu Zheng, San Jose, CA (US);
Mu Feng, San Jose, CA (US);
Qian Zhao, San Jose, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method involving determining an etch bias for a pattern to be etched using an etch step of a patterning process based on an etch bias model, the etch bias model including a formula having a variable associated with a spatial property of the pattern or with an etch plasma species concentration of the etch step, and including a mathematical term including a natural exponential function to the power of a parameter that is fitted or based on an etch time of the etch step; and adjusting the patterning process based on the determined etch bias.