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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12769213 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Aug. 01, 2020

Methods for improving process based contour information of structure in image

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Yunan Zheng, Fremont, CA (US);

Yongfa Fan, Sunnyvale, CA (US);

Mu Feng, San Jose, CA (US);

Leiwu Zheng, San Jose, CA (US);

Jen-Shiang Wang, Sunnyvale, CA (US);

Ya Luo, Saratoga, CA (US);

Chenji Zhang, San Jose, CA (US);

Jun Chen, San Jose, CA (US);

Zhenyu Hou, San Jose, CA (US);

Jinze Wang, Shenzhen, CN;

Feng Chen, San Jose, CA (US);

Ziyang MA, Mountain View, CA (US);

Xin Guo, Sunnyvale, CA (US);

Jin Cheng, Santa Clara, CA (US);

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman LLP

Primary Examiner:

Suchin Parihar

Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70625 (2013.01);
Abstract

A method for generating modified contours and/or generating metrology gauges based on the modified contours. A method of generating metrology gauges for measuring a physical characteristic of a structure on a substrate includes obtaining (i) measured data associated with the physical characteristic of the structure printed on the substrate, and (ii) at least portion of a simulated contour of the structure, the at least a portion of the simulated contour being associated with the measured data; modifying, based on the measured data, the at least a portion of the simulated contour of the structure; and generating the metrology gauges on or adjacent to the modified at least a portion of the simulated contour, the metrology gauges being placed to measure the physical characteristic of the simulated contour of the structure.

Find Patent Forward Citations

Zheng, Yunan. (2026). Methods for improving process based contour information of structure in image (U.S. Patent No. 12769213). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12769213

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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