The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Jan. 24, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Mu Feng, San Jose, CA (US);
Mir Farrokh Shayegan Salek, Santa Clara, CA (US);
Dianwen Zhu, San Jose, CA (US);
Leiwu Zheng, San Jose, CA (US);
Rafael C. Howell, Santa Clara, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G05B 19/41875 (2013.01); G05B 2219/33286 (2013.01); G05B 2219/45028 (2013.01); G05B 2219/49087 (2013.01);
Abstract
Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.