The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Oct. 26, 2009
Harry Sewell, Ridgefield, CT (US);
Eric Brian Catey, Danbury, CT (US);
Adel Joobeur, Milford, CT (US);
Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);
Harry Sewell, Ridgefield, CT (US);
Eric Brian Catey, Danbury, CT (US);
Adel Joobeur, Milford, CT (US);
Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.