The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Jan. 16, 2009
Harry Sewell, Ridgefield, CT (US);
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Louis John Markoya, Sandy Hook, CT (US);
Diane Mccafferty, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Louis John Markoya, Sandy Hook, CT (US);
Diane McCafferty, Sandy Hook, CT (US);
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding NV, Veldhoven, NL;
Abstract
A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.