Sandy Hook, CT, United States of America

Diane Czop McCafferty

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignees: Asml Holding N.v., Asml Netherlands B.v., Asml Holding B.v.. Active years: 2010-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Diane Czop McCafferty. Retrieved from https://idiyas.com/inventor/diane-czop-mccafferty

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 (Patent Applications = 1)

% Patents Active = 42.9

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 13(Granted Patents)

Company Filing History:

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2010-2017

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9632425 - Lithographic apparatus, a dryer and a method of removing liquid from a surface (2017-04-25),

2. 8736807 - Systems and methods for thermally-induced aberration correction in immersion lithography (2014-05-27),

3. 8629970 - Immersion lithographic apparatus with immersion fluid re-circulating system (2014-01-14),

4. 8451422 - Re-flow and buffer system for immersion lithography (2013-05-28),

5. 7995185 - Systems and methods for thermally-induced aberration correction in immersion lithography (2011-08-09),

6. 7751030 - Interferometric lithographic projection apparatus (2010-07-06),

7. 7684014 - Lithographic apparatus and device manufacturing method (2010-03-23),

Title: The Inventive Journey of Diane Czop McCafferty: A Pioneer in Innovation

Introduction:

Diane Czop McCafferty's inventive spirit and commitment to pushing the boundaries of what is possible serve as an inspiration to aspiring inventors worldwide. With seven patents to her name and a relentless pursuit of innovation, her impact in the field of immersion lithography is truly remarkable.

Latest Patents:

McCafferty's latest patents showcase her innovative approach to lithographic apparatus, introducing novel methods for drying and wetting surfaces in immersion lithography. By developing systems for thermally-induced aberration correction, she has revolutionized the way exposure energy is managed within an immersion fluid, ensuring precision and accuracy in the lithography process.

Career Highlights:

Having contributed significantly to the field of immersion lithography, McCafferty has worked with esteemed companies such as ASML Holding N.V. and ASML Netherlands B.V. Her expertise and ingenuity have been instrumental in advancing technological solutions for the semiconductor industry, shaping the future of lithographic processes.

Collaborations:

Throughout her career, McCafferty has collaborated closely with accomplished professionals such as Harry Sewell and Louis John Markoya. These collaborative efforts have led to groundbreaking advancements in immersion lithography, underscoring the power of teamwork in driving innovation and progress.

Conclusion:

Diane Czop McCafferty's journey as an inventor exemplifies the transformative impact of creativity, perseverance, and collaboration in driving meaningful change through innovations. Her dedication to excellence and relentless pursuit of new possibilities continue to shape the landscape of immersion lithography, leaving a lasting legacy in the world of technology and invention.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: