The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Jan. 30, 2006
Louis Markoya, Sandy Hook, CT (US);
Aleksandr Khmelichek, Brooklyn, NY (US);
Diane C. Mccafferty, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
Justin L. Kreuzer, Trumbull, CT (US);
Louis Markoya, Sandy Hook, CT (US);
Aleksandr Khmelichek, Brooklyn, NY (US);
Diane C. McCafferty, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
Justin L. Kreuzer, Trumbull, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.