Louis John Markoya

USPTO Granted Patents = 25 (Patent Applications = 1)

Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 49(Granted Patents)

Company Filing History:

Asml Netherlands B.v.

Lsi Logic Corporation

patents

where one patent can have more than one assignee

Years Active: 2005-2021

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25 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10908518 - Lithographic apparatus and method (2021-02-02),

2. 10649349 - Lithographic apparatus, a dryer and a method of removing liquid from a surface (2020-05-12),

3. 10185231 - Lithographic apparatus, a dryer and a method of removing liquid from a surface (2019-01-22),

4. 10001713 - Lithographic apparatus and method (2018-06-19),

5. 9632425 - Lithographic apparatus, a dryer and a method of removing liquid from a surface (2017-04-25),

6. 9330912 - Lithographic apparatus, fluid combining unit and device manufacturing method (2016-05-03),

7. 8817226 - Systems and methods for insitu lens cleaning using ozone in immersion lithography (2014-08-26),

8. 8736807 - Systems and methods for thermally-induced aberration correction in immersion lithography (2014-05-27),

9. 8654305 - Systems and methods for insitu lens cleaning in immersion lithography (2014-02-18),

10. 8629970 - Immersion lithographic apparatus with immersion fluid re-circulating system (2014-01-14),

11. 8451422 - Re-flow and buffer system for immersion lithography (2013-05-28),

12. 8203693 - Liquid immersion lithography system comprising a tilted showerhead relative to a substrate (2012-06-19),

13. 8045135 - Lithographic apparatus with a fluid combining unit and related device manufacturing method (2011-10-25),

14. 7995185 - Systems and methods for thermally-induced aberration correction in immersion lithography (2011-08-09),

15. 7838310 - Tunable alignment geometry (2010-11-23),

Certainly! Here is the article about inventor Louis John Markoya:

Title: Innovator Spotlight: Louis John Markoya

Introduction:

Louis John Markoya, a brilliant inventor based in Sandy Hook, CT, has made significant contributions to the field of lithography through his extensive portfolio of 25 patents. His innovative work has revolutionized the way surfaces are treated in various industrial processes.

Latest Patents:

One of his latest patents includes a cutting-edge lithographic apparatus and method. This apparatus features an electrostatic clamp designed to securely hold a reticle, enhancing precision and efficiency in lithography. Additionally, Louis John Markoya patented a novel drying and wetting method for surfaces, particularly beneficial in immersion lithography processes.

Career Highlights:

Louis John Markoya's expertise in lithography has been honed through his tenure at renowned companies such as ASML Holding N.V. and ASML Netherlands B.V. His innovative solutions have garnered recognition within the industry for their practicality and effectiveness in improving manufacturing processes.

Collaborations:

Throughout his career, Louis John Markoya has collaborated with accomplished professionals in the field, including esteemed coworkers Harry Sewell and Diane Czop McCafferty. Together, they have pushed the boundaries of innovation and set new standards in surface treatment technologies.

Conclusion:

In conclusion, Louis John Markoya stands out as a visionary inventor whose dedication to advancing lithography has led to groundbreaking patents that continue to shape the industry. His contributions have not only enhanced efficiency in manufacturing processes but have also paved the way for future technological advancements in surface treatment.

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