The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

May. 18, 2018
Applicants:

Asml Holding N.v., Veldhoven, NL;

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Santiago E. Delpuerto, Myrtle Beach, SC (US);

Antonius Franciscus Johannes De Groot, Someren, NL;

Kenneth C. Henderson, Norwalk, CT (US);

Raymond Wilhelmus Louis Lafarre, Helmond, NL;

Matthew Lipson, Stamford, CT (US);

Louis John Markoya, Sandy Hook, CT (US);

Tammo Uitterdijk, Wilton, CT (US);

Ronald Van Der Wilk, Knegsel, NL;

Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;

Assignees:

ASML Holding N.V., Veldhoven, NL;

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70875 (2013.01); G03F 7/7095 (2013.01); G03F 7/70708 (2013.01); G03F 7/70975 (2013.01); H01L 21/6831 (2013.01); H01L 21/6875 (2013.01);
Abstract

A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.


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