The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Dec. 20, 2018
Applicants:

Asml Netherlands B.v., Veldhoven, NL;

Asml Holding N.v., Veldhoven, NL;

Inventors:

Martinus Hendrikus Antonius Leenders, Rhoon, NL;

Sjoerd Nicolaas Lambertus Donders, Vught, NL;

Harry Sewell, Ridgefield, CT (US);

Louis John Markoya, Sandy Hook, CT (US);

Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;

Diane Elaine Markoya, Sandy Hook, CT (US);

Assignees:

ASML HOLDING N.V., Veldhoven, NL;

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70866 (2013.01); G03F 7/70341 (2013.01); G03F 7/70875 (2013.01);
Abstract

A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.


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