Sandy Hook, CT, United States of America

Diane Elaine Markoya


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Spotlight on Diane Elaine Markoya: Inventor and Innovator

Introduction:

Diane Elaine Markoya, a brilliant inventor hailing from Sandy Hook, CT, has been making waves in the field of technology with her innovative solutions and patents. With two patents under her belt, Diane has made significant contributions to the world of immersion lithography and surface drying techniques.

Latest Patents:

Diane's latest patents revolve around a groundbreaking method of drying and wetting surfaces, particularly beneficial in immersion lithography processes. By introducing a single-phase extractor and precise priming liquid delivery system, Diane's inventions have revolutionized the way surfaces are treated in lithographic apparatus. This innovative approach ensures efficient and effective surface treatment throughout the drying and wetting processes.

Career Highlights:

Diane Elaine Markoya has showcased her expertise and ingenuity while working with renowned companies such as ASML Holding N.V. and ASML Netherlands B.V. Her exceptional problem-solving skills and forward-thinking approach have led to the development of cutting-edge technologies in the field of lithography and surface treatment.

Collaborations:

Throughout her career, Diane has collaborated with esteemed professionals in the industry, including Martinus Hendrikus Antonius Leenders and Sjoerd Nicolaas Lambertus Donders. Together, they have synergized their skills and knowledge to push the boundaries of innovation and drive technological advancements in their respective fields.

Conclusion:

In conclusion, Diane Elaine Markoya stands as a shining example of female inventors who are making significant strides in the world of technology. Her dedication to innovation, coupled with her remarkable patents and collaborations, cements her legacy as a visionary inventor shaping the future of immersion lithography and surface treatment methodologies.

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