The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Sep. 21, 2011
Applicants:
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Matthew Lipson, Stamford, CT (US);
Harry Sewell, Ridgefield, CT (US);
Louis John Markoya, Sandy Hook, CT (US);
Inventors:
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Matthew Lipson, Stamford, CT (US);
Harry Sewell, Ridgefield, CT (US);
Louis John Markoya, Sandy Hook, CT (US);
Assignees:
ASML NETHERLANDS B.V., Veldhoven, NL;
ASML HOLDING N.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0274 (2013.01); G03F 7/70341 (2013.01);
Abstract
A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.