The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Apr. 19, 2006
Aleksandr Khmelichek, Brooklyn, NY (US);
Marina Khmelichek, Legal Representative, Brooklyn, NY (US);
Harry Sewell, Ridgefield, CT (US);
Louis John Markoya, Sandy Hook, CT (US);
Erik Roelof Loopstra, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Aleksandr Khmelichek, Brooklyn, NY (US);
Marina Khmelichek, legal representative, Brooklyn, NY (US);
Harry Sewell, Ridgefield, CT (US);
Louis John Markoya, Sandy Hook, CT (US);
Erik Roelof Loopstra, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A liquid immersion lithography system includes projection optics (PL) and a showerhead (). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle () and a second nozzle () that are configured to be at different distances from a surface of the substrate during an exposure operation.