The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Feb. 19, 2009
Harry Sewell, Ridgefield, CT (US);
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Louis John Markoya, Sandyhook, CT (US);
Diane Mccafferty, Sandyhook, CT (US);
Ralph Joseph Meijers, Kerkrade, NL;
Harry Sewell, Ridgefield, CT (US);
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Louis John Markoya, Sandyhook, CT (US);
Diane McCafferty, Sandyhook, CT (US);
Ralph Joseph Meijers, Kerkrade, NL;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding NV, Veldhoven, NL;
Abstract
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.