The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Jun. 28, 2022
Asml Holding N.v., Veldhoven, NL;
Daniel Nathan Burbank, Ridgefield, CT (US);
Andi Dine, Stamford, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device, a projection system to project an image of the pattern onto a substrate, a movable stage to support the patterning device or the substrate, a slotted object, and a locking device () to prevent a motion of the movable stage. The locking device comprises an actuator () and a wheel device () comprising a ring feature () and coupled to the actuator. The actuator rotates the wheel device about a rotation axis (). The ring feature has a width () defined parallel to the rotation axis. The width is variable with respect to azimuthal direction of the wheel device. The ring feature engages a slot of the slotted object. The rotating adjusts the width of the ring feature within the slot such that a relative motion between the device and the slotted object is prevented.