Andi Dine

Title: Andi Dine: Innovator in Lithographic Technology

Introduction

Andi Dine is a notable inventor based in Stamford, CT (US). She has made significant contributions to the field of lithographic technology, showcasing her innovative spirit through her patented inventions.

Latest Patents

Andi Dine holds a patent for a lithographic apparatus, locking device, and method. This invention includes an illumination system designed to illuminate a pattern of a patterning device. It features a projection system that projects an image of the pattern onto a substrate, along with a movable stage that supports either the patterning device or the substrate. The apparatus also incorporates a slotted object and a locking device that prevents motion of the movable stage. The locking device consists of an actuator and a wheel device that includes a ring feature, which is coupled to the actuator. The actuator rotates the wheel device about a rotation axis, and the ring feature has a variable width defined parallel to this axis. This design ensures that relative motion between the device and the slotted object is effectively prevented.

Career Highlights

Andi Dine is currently employed at ASML Holding N.V., a leading company in the lithography equipment sector. Her work at ASML has allowed her to contribute to advancements in semiconductor manufacturing technology.

Collaborations

Andi collaborates with her coworker, Daniel Nathan Burbank, who is also involved in innovative projects within the company.

Conclusion

Andi Dine's contributions to lithographic technology exemplify her dedication to innovation and her impact on the industry. Her patent reflects her expertise and commitment to advancing technology in her field.