The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Jun. 28, 2022
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventors:

Mohamed Swillam, Wilton, CT (US);

Wei Guo, Wilton, CT (US);

Stephen Roux, New Fairfield, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01N 21/956 (2006.01); G02F 1/295 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706849 (2023.05); G01N 21/956 (2013.01); G02F 1/2955 (2013.01); G03F 7/7065 (2013.01); G03F 7/706837 (2023.05); G03F 7/706847 (2023.05);
Abstract

A metrology system includes a radiation source (), a phased array (), a detector, and a comparator. The phased array includes optical elements (), waveguides (), and phase modulators (). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.


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