Average Co-Inventor Count = 2.2

ph-index = 10

Forward Citations = 210(Granted Patents)

Location History:

Danbury, CT (US) (2001 - 2011)
San Jose, CA (US) (2008 - 2022)

Company Filing History:

Siemens Industry Software Gmbh

Kla Tencor Corporation

Years Active: 2001-2022

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45 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11270054 - Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process (2022-03-08),

2. 11061373 - Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process (2021-07-13),

3. 10153162 - Shrink process aware assist features (2018-12-11),

4. 9530662 - Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control (2016-12-27),

5. 9305834 - Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structures (2016-04-05),

6. 9305800 - Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features (2016-04-05),

7. 9286434 - Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patterns (2016-03-15),

8. 9208275 - Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (2015-12-08),

9. 9170501 - Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (2015-10-27),

10. 9053923 - Methods for fabricating integrated circuits including topographical features for directed self-assembly (2015-06-09),

11. 9023730 - Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assembly (2015-05-05),

12. 9009634 - Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (2015-04-14),

13. 8856698 - Method and apparatus for providing metric relating two or more process parameters to yield (2014-10-07),

14. 8667430 - Methods for directed self-assembly process/proximity correction (2014-03-04),

15. 8667428 - Methods for directed self-assembly process/proximity correction (2014-03-04),

Title: Azat M Latypov: Pushing the Boundaries of Innovation in Lithographic Processes

Introduction:

Azat M Latypov, a visionary inventor based in Danbury, CT (US), is a true pioneer in the world of innovation. With an impressive track record of 45 patents to his name, he has consistently demonstrated his ability to turn groundbreaking ideas into reality.

Latest Patents:

Two of his latest patents include:

1. Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process

2. Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process

These patents highlight Azat's expertise in developing systems and methods to address the stochastic variations that can pose challenges in the lithographic process.

Career Highlights:

Azat M Latypov has made significant contributions to the field of innovation through his work at companies such as ASML Holding N.V. and GlobalFoundries Inc. His expertise in lithographic processes has enabled these companies to stay at the forefront of technological advancements in the industry.

Collaborations:

Throughout his career, Azat has collaborated with esteemed colleagues such as Wenceslao A Cebuhar and Arno Jan Bleeker. These partnerships have led to the development of cutting-edge solutions that have reshaped the landscape of lithographic processes.

Conclusion:

In conclusion, Azat M Latypov's relentless pursuit of excellence and commitment to pushing the boundaries of what is possible make him a standout figure in the field of inventors. His innovative spirit and dedication to addressing challenges in lithographic processes have cemented his legacy as a true visionary in the world of innovation.

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