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Milpitas, CA, United States of America

Kla Tencor Corporation

USPTO Granted Patents = 1,787

% Expired Patents = 14.2

EPO Patents = 202

Trademarks = 53

Forward Citations = 18,393

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1,411 inventors (with patents filed for the assignee):

Yung-Ho Alex Chuang (100 out of 162 patents)

John Fielden (77 out of 142 patents)

Andrei V Shchegrov (63 out of 98 patents)

4. Vladimir Levinski (58 out of 101 patents)

5. Amnon Manassen (56 out of 121 patents)

6. Guoheng Zhao (52 out of 96 patents)

7. Ilya Bezel (50 out of 72 patents)

8. Lisheng Gao (49 out of 55 patents)

9. Daniel Kandel (47 out of 57 patents)

10. Stilian Pandev (46 out of 68 patents)

11. J Joseph Armstrong (44 out of 68 patents)

12. Anatoly Shchemelinin (42 out of 50 patents)

13. Mehdi Vaez-Iravani (40 out of 107 patents)

14. Gildardo Rios Delgado (40 out of 50 patents)

15. Leonid Poslavsky (39 out of 49 patents)

Core Competencies:

Misregistration Correction

Machine Learning

Optical Inspection

X-ray Scatterometry

Defect Detection

Overlay Measurement

3D Microscopy

Critical Dimension

Process Control

Metrology Targets

Nanostructures

Image Processing

1,787 patents: Sort by Forward Citations

1. 12347706 - Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein (2025-07-01),

2. 12265212 - 3D microscope including insertable components to provide multiple imaging and measurement capabilities (2025-04-01),

3. 12094101 - Inspection of reticles using machine learning (2024-09-17),

4. 12013634 - Reduction or elimination of pattern placement error in metrology measurements (2024-06-18),

5. 11971664 - Reducing device overlay errors (2024-04-30),

6. 11955391 - Process monitoring of deep structures with X-ray scatterometry (2024-04-09),

7. 11815347 - Optical near-field metrology (2023-11-14),

8. 11784097 - Measurement of overlay error using device inspection system (2023-10-10),

9. 11709433 - Device-like metrology targets (2023-07-25),

10. 11694327 - Cross layer common-unique analysis for nuisance filtering (2023-07-04),

11. 11580375 - Accelerated training of a machine learning based model for semiconductor applications (2023-02-14),

12. 11555689 - Measuring thin films on grating and bandgap on grating (2023-01-17),

13. 11551980 - Dynamic amelioration of misregistration measurement (2023-01-10),

14. 11537837 - Automated accuracy-oriented model optimization system for critical dimension metrology (2022-12-27),

15. 11537043 - Reduction or elimination of pattern placement error in metrology measurements (2022-12-27),

Company Overview

Kla Tencor Corporation, headquartered in Milpitas, California, specializes in semiconductor metrology and process control solutions. The company develops advanced technologies for misregistration correction, optical inspection, and defect detection, enhancing the precision and efficiency of semiconductor manufacturing. Its expertise extends to machine learning applications, overlay measurement, and 3D microscopy, positioning Kla Tencor as a leader in ensuring the integrity and performance of semiconductor devices in a rapidly evolving industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

1,787 Patents

#3 in Milpitas, CA

#73 in California

#286 in US

#563 in the World

Milpitas, CA, United States of America

Kla Tencor Corporation

Forward Citations = 18,393

1,411 inventors:

Yung-Ho Alex Chuang (100 out of 162 patents)

John Fielden (77 out of 142 patents)

Andrei V Shchegrov (63 out of 98 patents)

4. Vladimir Levinski (58 out of 101 patents)

5. Amnon Manassen (56 out of 121 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Kla Tencor Corporation. Retrieved from https://idiyas.com/company/kla-tencor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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