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Milpitas, CA, United States of America

Kla Tencor Corporation

USPTO Granted Patents = 1,787

% Expired Patents = 14.2

EPO Patents = 199

Trademarks = 53

Forward Citations = 18,393

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1,409 inventors (with patents filed for the assignee):

Yung-Ho Alex Chuang (100 out of 162 patents)

John Fielden (77 out of 142 patents)

Andrei V Shchegrov (63 out of 98 patents)

4. Vladimir Levinski (58 out of 101 patents)

5. Amnon Manassen (56 out of 121 patents)

6. Guoheng Zhao (52 out of 96 patents)

7. Ilya Bezel (50 out of 72 patents)

8. Lisheng Gao (49 out of 55 patents)

9. Daniel Kandel (47 out of 57 patents)

10. Stilian Pandev (46 out of 68 patents)

11. J Joseph Armstrong (44 out of 68 patents)

12. Anatoly Shchemelinin (42 out of 50 patents)

13. Mehdi Vaez-Iravani (40 out of 107 patents)

14. Gildardo Rios Delgado (40 out of 50 patents)

15. Leonid Poslavsky (39 out of 49 patents)

Core Competencies:

Misregistration Correction

Machine Learning

Optical Inspection

X-ray Scatterometry

Defect Detection

Overlay Measurement

3D Microscopy

Critical Dimension

Process Control

Metrology Targets

Nanostructures

Image Processing

1,787 patents: Sort by Forward Citations

1. 12347706 - Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein (2025-07-01),

2. 12265212 - 3D microscope including insertable components to provide multiple imaging and measurement capabilities (2025-04-01),

3. 12094101 - Inspection of reticles using machine learning (2024-09-17),

4. 12013634 - Reduction or elimination of pattern placement error in metrology measurements (2024-06-18),

5. 11971664 - Reducing device overlay errors (2024-04-30),

6. 11955391 - Process monitoring of deep structures with X-ray scatterometry (2024-04-09),

7. 11815347 - Optical near-field metrology (2023-11-14),

8. 11784097 - Measurement of overlay error using device inspection system (2023-10-10),

9. 11709433 - Device-like metrology targets (2023-07-25),

10. 11694327 - Cross layer common-unique analysis for nuisance filtering (2023-07-04),

11. 11580375 - Accelerated training of a machine learning based model for semiconductor applications (2023-02-14),

12. 11555689 - Measuring thin films on grating and bandgap on grating (2023-01-17),

13. 11551980 - Dynamic amelioration of misregistration measurement (2023-01-10),

14. 11537837 - Automated accuracy-oriented model optimization system for critical dimension metrology (2022-12-27),

15. 11537043 - Reduction or elimination of pattern placement error in metrology measurements (2022-12-27),

KLA Corporation, a leading provider of process control and yield management solutions, partners with customers around the world to develop state-of-the-art inspection and metrology technologies. These technologies serve the semiconductor, data storage, LED, and other related nanoelectronics industries. With a portfolio of industry-standard products and a team of talented professionals, KLA is dedicated to enabling next-generation devices and accelerating the pace of innovation.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 15 2026

Kla Tencor Corporation

1,787 Patents

#3 in Milpitas, CA

#72 in California

#285 in US

#562 in the World

Milpitas, CA, United States of America

Kla Tencor Corporation

Forward Citations = 18,393

1,409 inventors:

Yung-Ho Alex Chuang (100 out of 162 patents)

John Fielden (77 out of 142 patents)

Andrei V Shchegrov (63 out of 98 patents)

4. Vladimir Levinski (58 out of 101 patents)

5. Amnon Manassen (56 out of 121 patents)

Please report any incorrect information to [email protected]

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