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Company Filing History:
56 out of 1,787 
49 out of 528 
3 out of 16 
Years Active: 2001-2025
Title: Amnon Manassen: A Pioneer in Metrology Systems and Patents
Introduction:
Amnon Manassen, a resident of Haifa, IL, is a highly accomplished inventor and researcher known for his groundbreaking contributions in the field of metrology systems. With an impressive portfolio of 91 patents, Manassen has made significant advancements in the development of imaging sub-systems and overlay metrology techniques. This article will delve into his latest patents, career highlights, collaborations, and recognize his exceptional contributions in the field.
Latest Patents:
Among his recent patents, Manassen has developed two breakthrough systems: "Systems and Methods for Metrology with Layer-Specific Illumination Spectra" and "Moiré Scatterometry Overlay."
The "Systems and Methods for Metrology with Layer-Specific Illumination Spectra" patent introduces a novel metrology system that utilizes specialized imaging configurations to capture metrology target elements on multiple sample layers. By employing layer-specific imaging configurations within a selected image quality tolerance, Manassen's invention improves the accuracy and effectiveness of metrology measurements.
The "Moiré Scatterometry Overlay" patent showcases Manassen's expertise in overlay metrology. This technology involves scanning a sample with inverted Moiré structures, capturing diffraction orders, and utilizing diffractive elements to extract interference patterns. Manassen's invention greatly enhances the precision of overlay measurements, aiding in high-quality semiconductor manufacturing processes.
Career Highlights:
Throughout his career, Amnon Manassen has worked with renowned companies in the field of metrology. He has made notable contributions during his tenure at KLA-Tencor Corporation and KLA Corporation, where he applied his expertise in developing innovative metrology systems. His extensive experience and consistent track record of success have earned him a stellar reputation within the industry.
Collaborations:
Amnon Manassen's passion for innovation has led him to work alongside esteemed colleagues, including Andrew V Hill and Vladimir Levinski. Collaborating with experts in the field has further amplified Manassen's ability to conceptualize and develop cutting-edge metrology technologies. These collaborations have not only fostered his professional growth but have also accelerated the pace of technological advancements in the field.
Conclusion:
Amnon Manassen's remarkable contribution to metrology systems and his extensive patent portfolio underscore his innovative mindset and dedication to advancing technology. His latest patents, namely the "Systems and Methods for Metrology with Layer-Specific Illumination Spectra" and "Moiré Scatterometry Overlay," highlight his expertise in developing novel techniques that improve accuracy and precision in metrology measurements. With a successful career and ongoing collaborations with distinguished colleagues, Amnon Manassen continues to inspire and shape the future of metrology.
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