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For the Inventor, By the Inventor

Milpitas, CA, United States of America

Kla Corporation


USPTO Granted Patents = 615

% Expired Patents = 0.65


Trademarks = 68

Forward Citations = 563

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922 inventors (with patents filed for the assignee):

goldMedal Amnon Manassen (58 out of 121 patents)

silverMedal Andrew V Hill (38 out of 80 patents)

bronzeMedal Vladimir Levinski (35 out of 101 patents)

4.  John Fielden (29 out of 142 patents)

5.  Yung-Ho Alex Chuang (29 out of 162 patents)

6.  Stilian Pandev (21 out of 68 patents)

7.  Daria Negri (21 out of 33 patents)

8.  Ilya Bezel (21 out of 72 patents)

9.  Mark Ghinovker (21 out of 84 patents)

10.  Bjorn Brauer (19 out of 45 patents)

11.  Andrei V Shchegrov (19 out of 98 patents)

12.  Yoel Feler (19 out of 40 patents)

13.  Yinying Xiao-Li (17 out of 21 patents)

14.  Roie Volkovich (16 out of 35 patents)

15.  Sangbong Park (16 out of 25 patents)


Core Competencies:
Defect Detection
Optical Characterization
EUV Lithography
Image Processing
Measurement Uncertainty
Electron Microscopy
Spectral Measurement
High Resolution Imaging
Machine Learning
Semiconductor Structures
Metrology Systems
Plasma Light Source

615 patents:

1. 12757686 - Substrate handling apparatus for extreme warped wafers (2026-10-06),
2. 12755922 - Method of fabricating a high-pressure laser-sustained-plasma lamp (2026-10-06),
3. 12754482 - Field mirrors for imaging field compression driven photon efficiency and imaging wavefront improvement (2026-10-06),
4. 12752312 - Optical table cleaning devices and methods of cleaning optical tables (2026-10-06),
5. 12751233 - Method to perform in-situ vacuum contamination measurement and identification in arbitrarily large chambers (2026-09-29),
6. 12747943 - Mosaic overlay targets (2026-09-29),
7. 12743768 - Adaptive and robust detection of large defects and image misalignment (2026-09-22),
8. 12743027 - Methods and systems for model-less, scatterometry based measurements of semiconductor structures (2026-09-22),
9. 12731248 - System and method for defect detection using a conditional masked autoencoder (2026-09-08),
10. 12731239 - Digital nonlinear neural network based image filtering for semiconductor applications (2026-09-08),
11. 12721111 - Mini environment instrumented wafer (2026-08-25),
12. 12717248 - Off-axis through the lens mutually coherent dark field imaging system with incoherent light for overlay metrology (2026-08-25),
13. 12716837 - Scanning diffraction based overlay scatterometry (2026-08-25),
14. 12710698 - METHODS FOR MEASUREMENT OF rAIM (2026-08-18),
15. 12710378 - SYSTEM AND METHOD FOR WAFER SHAPE PAIRING FOR IMPROVED POST-BONDING PERFORMANCE (2026-08-18),
KLA Corporation, headquartered in Milpitas, California, specializes in advanced overlay metrology solutions that enhance semiconductor manufacturing processes. The company focuses on critical areas such as defect detection, optical characterization, and EUV lithography, providing essential tools for high-resolution imaging and measurement uncertainty. KLA's expertise extends to image processing and electron microscopy, enabling precise spectral measurement and contributing to the advancement of technology in the semiconductor industry.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Oct 6 2026

Kla Corporation
615 Patents

#12 in Milpitas, CA

#181 in California

#809 in US

#1,595 in the World

Milpitas, CA (US)
Milpitas, CA, United States of America

Kla Corporation

Forward Citations = 563

922 inventors:

goldMedal Amnon Manassen (58 out of 121 patents)

silverMedal Andrew V Hill (38 out of 80 patents)

bronzeMedal Vladimir Levinski (35 out of 101 patents)

4.  John Fielden (29 out of 142 patents)

5.  Yung-Ho Alex Chuang (29 out of 162 patents)

Please report any incorrect information to [email protected]
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