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Milpitas, CA, United States of America

Kla Corporation

USPTO Granted Patents = 607

% Expired Patents = 0.66

EPO Patents = 41

Trademarks = 68

Forward Citations = 563

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897 inventors (with patents filed for the assignee):

Amnon Manassen (58 out of 121 patents)

Andrew V Hill (38 out of 80 patents)

Vladimir Levinski (35 out of 101 patents)

4. John Fielden (29 out of 142 patents)

5. Yung-Ho Alex Chuang (29 out of 162 patents)

6. Stilian Pandev (21 out of 68 patents)

7. Daria Negri (21 out of 33 patents)

8. Ilya Bezel (21 out of 72 patents)

9. Mark Ghinovker (21 out of 84 patents)

10. Bjorn Brauer (19 out of 45 patents)

11. Andrei V Shchegrov (19 out of 98 patents)

12. Yoel Feler (18 out of 39 patents)

13. Yinying Xiao-Li (17 out of 21 patents)

14. Roie Volkovich (16 out of 35 patents)

15. Sangbong Park (16 out of 25 patents)

Core Competencies:

Defect Detection

Optical Characterization

EUV Lithography

Image Processing

Measurement Uncertainty

Electron Microscopy

Spectral Measurement

High Resolution Imaging

Machine Learning

Semiconductor Structures

Metrology Systems

Plasma Light Source

607 patents: Sort by Forward Citations

1. 12731248 - System and method for defect detection using a conditional masked autoencoder (2026-09-08),

2. 12731239 - Digital nonlinear neural network based image filtering for semiconductor applications (2026-09-08),

3. 12721111 - Mini environment instrumented wafer (2026-08-25),

4. 12717248 - Off-axis through the lens mutually coherent dark field imaging system with incoherent light for overlay metrology (2026-08-25),

5. 12716837 - Scanning diffraction based overlay scatterometry (2026-08-25),

6. 12710698 - METHODS FOR MEASUREMENT OF rAIM (2026-08-18),

7. 12710378 - SYSTEM AND METHOD FOR WAFER SHAPE PAIRING FOR IMPROVED POST-BONDING PERFORMANCE (2026-08-18),

8. 12705724 - System and method for defect detection using deep learning-based image segmentation (2026-08-11),

9. 12704790 - System and method for determining overlay measurement of a scanning target (2026-08-11),

10. 12704789 - Flexible measurement models for model based measurements of semiconductor structures (2026-08-11),

11. 12704788 - Parallax method for a single-cell diffraction based measurement of misregistration (2026-08-11),

12. 12704787 - Single-cell scatterometry overlay with sensitivity calibration (2026-08-11),

13. 12704465 - Methods and systems for nanoscale imaging based on second harmonic signal generation and through-focus scanning optical microscopy (2026-08-11),

14. 12704447 - Device and method to calibrate or verify the displacement-measurement system of an instrumented indenter (2026-08-11),

15. 12698962 - Metrology target for one-dimensional measurement of periodic misregistration (2026-08-04),

KLA Corporation is a leading provider of process control and yield management solutions for the semiconductor and related nanoelectronics industries. The company's innovations enable devices to be built at increasingly higher levels of performance and at lower costs. KLA Corporation's products and services are used by chip manufacturers worldwide to improve their manufacturing processes and yields. With headquarters in Milpitas, California, KLA Corporation operates globally with offices, manufacturing sites, and R&D centers located in key semiconductor manufacturing regions.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 15 2026

Kla Corporation

607 Patents

#12 in Milpitas, CA

#181 in California

#812 in US

#1,607 in the World

Milpitas, CA, United States of America

Kla Corporation

Forward Citations = 563

897 inventors:

Amnon Manassen (58 out of 121 patents)

Andrew V Hill (38 out of 80 patents)

Vladimir Levinski (35 out of 101 patents)

4. John Fielden (29 out of 142 patents)

5. Yung-Ho Alex Chuang (29 out of 162 patents)

Please report any incorrect information to [email protected]

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