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For the Inventor, By the Inventor

Migdal Haemek, Israel

Mark Ghinovker

USPTO Granted Patents = 80 

 

Average Co-Inventor Count = 3.2

ph-index = 21

Forward Citations = 1,167(Granted Patents)

Forward Citations (Not Self Cited) = 944(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Migsdale Ha'Emek, IL (2005 - 2007)
  • Migdal Maemek, IL (2008)
  • Migdel Ha'Emek, IL (2009)
  • Ilit, IL (2010)
  • Yokneam Ilit., IL (2012)
  • Yokneam Ilit, IL (2013 - 2015)
  • Midgal Haemek, IL (2011 - 2016)
  • Migdal Haemek, IL (2005 - 2017)
  • Yoqneam Illit, IL (2021)
  • Yoqneam Ilit, IL (2013 - 2024)
  • Yoqneam llit, IL (2024)

Company Filing History:

goldMedal30 out of 641 
 
Kla-tencor Technologies Corporation
 patents
silverMedal29 out of 1,787 
 
Kla Tencor Corporation
 patents
bronzeMedal17 out of 528 
 
Kla Corporation
 patents
4. 1 out of 1 
 
Kla Con
 patent
5. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 2005-2025

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80 patents (USPTO):
1. 12482687 - Single cell in-die metrology targets and measurement methods (2025-11-25),
2. 12423803 - Predicting tool induced shift using Moiré overlay targets (2025-09-23),
3. 12204254 - Multi-layered moiré targets and methods for using the same in measuring misregistration of semiconductor devices (2025-01-21),
4. 12105433 - Imaging overlay targets using moiré elements and rotational symmetry arrangements (2024-10-01),
5. 12094100 - Measurement of stitching error using split targets (2024-09-17),
6. 12055859 - Overlay mark design for electron beam overlay (2024-08-06),
7. 12013634 - Reduction or elimination of pattern placement error in metrology measurements (2024-06-18),
8. 11874605 - Verification metrology targets and their design (2024-01-16),
9. 11862524 - Overlay mark design for electron beam overlay (2024-01-02),
10. 11809090 - Composite overlay metrology target (2023-11-07),
11. 11774863 - Induced displacements for improved overlay error metrology (2023-10-03),
12. 11720031 - Overlay design for electron beam and scatterometry overlay measurements (2023-08-08),
13. 11703767 - Overlay mark design for electron beam overlay (2023-07-18),
14. 11686576 - Metrology target for one-dimensional measurement of periodic misregistration (2023-06-27),
15. 11537043 - Reduction or elimination of pattern placement error in metrology measurements (2022-12-27),

Title: Mark Ghinovker - Innovator from Migdal Haemek

Introduction: Mark Ghinovker is a renowned inventor hailing from Migdal Haemek, Israel. With a passion for innovation and a keen eye for problem-solving, he has made significant contributions to various fields through his inventive spirit.

Latest Patents: Mark Ghinovker holds several patents in the areas of technology and healthcare, showcasing his diverse range of interests and expertise. His latest patents focus on cutting-edge solutions for everyday challenges faced by individuals and industries alike.

Career Highlights: Throughout his career, Mark Ghinovker has been recognized for his groundbreaking inventions that have revolutionized the way we live and work. His commitment to pushing the boundaries of what is possible has led to numerous successes in the innovation landscape.

Collaborations: Mark Ghinovker has collaborated with leading companies and research institutions to bring his ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the development of innovative products that have had a lasting impact on society.

Conclusion: In conclusion, Mark Ghinovker's dedication to innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventors. His inventive spirit continues to inspire others to think creatively and push the boundaries of what is achievable.

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