The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Sep. 28, 2021
Kla Corporation, Milpitas, CA (US);
Inna Steely-Tarshish, Yokneam Ilit, IL;
Stefan Eyring, Weilburg, DE;
Mark Ghinovker, Yoqneam Ilit, IL;
Yoel Feler, Haifa, IL;
Eitan Hajaj, Ashqelon, IL;
Ulrich Pohlmann, Jena, DE;
Nadav Gutman, Zichron Ya'aqov, IL;
Chris Steely, Yokneam Ilit, IL;
Raviv Yohanan, Qiryat Motzkin, IL;
Ira Naot, Milpitas, CA (US);
Abstract
The present disclosure provides a target and a method of performing overlay measurements on a target. The target includes an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell. Each cell includes a periodic structure with a pitch. The periodic structure includes a first section and a second section, separated by a first gap. The target further includes an electron beam overlay target, such that electron beam overlay measurements, advanced imaging metrology, and/or scatterometry measurements can be performed on the target.