Eitan Hajaj

Title: Eitan Hajaj: Innovator in Optical Metrology

Introduction

Eitan Hajaj is a prominent inventor based in Ashqelon, Israel, known for his significant contributions to the field of optical metrology. With a total of 11 patents to his name, Hajaj has made remarkable advancements that enhance measurement techniques in various applications.

Latest Patents

Hajaj's latest patents include innovative technologies such as an optical metrology tool that utilizes short-wave infrared wavelengths. This tool features multiple illumination sources that generate light within and outside the short-wave infrared spectral range. It is equipped with imaging channels that capture images of samples, allowing for precise optical metrology measurements. Another notable patent involves a method for semiconductor metrology, which includes the deposition and patterning of film layers on a semiconductor substrate to define an overlay target. This method captures scatterometric images to estimate overlay errors, showcasing Hajaj's expertise in semiconductor technology.

Career Highlights

Throughout his career, Eitan Hajaj has worked with leading companies in the industry, including Kla Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in optical and semiconductor metrology.

Collaborations

Hajaj has collaborated with talented individuals such as Raviv Yohanan and Inna Steely-Tarshish. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies in the field.

Conclusion

Eitan Hajaj's work in optical metrology and semiconductor technology has established him as a key figure in innovation. His patents reflect a commitment to advancing measurement techniques, making significant contributions to the industry.