The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Nov. 04, 2016
Kla-tencor Corporation, Milpitas, CA (US);
Vladimir Levinski, Migdal HaEmek, IL;
Eitan Hajaj, Ashqelon, IL;
Tal Itzkovich, Kfar Uriya, IL;
Sharon Aharon, Hanaton, IL;
Michael E. Adel, Zichron Ya'akov, IL;
Yuri Paskover, Caesarea, IL;
Daria Negri, Haifa, IL;
Yuval Lubashevsky, Haifa, IL;
Amnon Manassen, Haifa, IL;
Myungjun Lee, San Jose, CA (US);
Mark D. Smith, San Jose, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.