Location History:
- Kfar Uria, IL (2015)
- Kfar Yriya, IL (2019)
- Kfar Uriya, IL (2016 - 2020)
Company Filing History:
Years Active: 2015-2020
Title: Tal Itzkovich: Innovator in Metrology Target Design
Introduction
Tal Itzkovich is an esteemed inventor based in Kfar Uriya, Israel. With a portfolio of seven patents, he has significantly contributed to advancements in metrology and imaging technologies. His innovative solutions help improve the precision of measurements in various applications, notably in the fields of semiconductor manufacturing and optical systems.
Latest Patents
One of Tal Itzkovich's latest patents focuses on "Process compatibility improvement by fill factor modulation." This invention outlines metrology targets and design methods that enhance the fidelity of the targets. By replacing elements from a periodic pattern with assist elements possessing geometric differences, the target maintains pitch while adapting for advanced multiple patterning techniques. This progress ensures improved sensitivity in overlay extraction and overall process compatibility.
Another recent patent, titled "Compound imaging metrology targets," describes imaging metrology targets that integrate one-dimensional (1D) and two-dimensional (2D) elements. This design allows for the collection of 1D imaging metrology signals across two measurement directions while providing at least one 2D imaging metrology overlay signal. The combination of these elements in a compact and possibly multilayered structure facilitates process compatibility and manufacturing efficiency.
Career Highlights
Tal Itzkovich has garnered significant experience during his career, having worked for prominent companies such as KLA-Tencor Corporation. His roles in these organizations allowed him to refine his expertise in metrology and imaging technologies, contributing to the advancement of cutting-edge solutions in the industry.
Collaborations
Throughout his career, Tal has collaborated with many skilled professionals, including Nuriel Amir and DongSub Choi. These partnerships have played an essential role in developing innovative products and technologies that push the boundaries of current capabilities in metrology.
Conclusion
Tal Itzkovich continues to make a remarkable impact on the field of metrology through his innovative patents and collaborative efforts. His commitment to advancing technology and improving measurement precision positions him as a significant figure among today's inventors, shaping the future of the industry with his inventions.