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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9903711 B1

PDFFull Text
Date of Patent:
Feb. 27, 2018

Filed:

Apr. 04, 2016

Feed forward of metrology data in a metrology system

Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Ady Levy, San Jose, CA (US);

Daniel Kandel, Aseret, IL;

Michael E. Adel, Ya'akov, IL;

Leonid Poslavsky, Belmont, CA (US);

John Robinson, Austin, TX (US);

Tal Marciano, Yokneam, IL;

Barak Bringoltz, Le Tzion, IL;

Tzahi Grunzweig, Yokneam, IL;

Dana Klein, Haifa, IL;

Tal Itzkovich, kfar Uriya, IL;

Nadav Carmel, Mevasseret-Zion, IL;

Nuriel Amir, Yokne'am Ilit, IL;

Vidya Ramanathan, Milpitas, CA (US);

Janay Camp, Milpitas, CA (US);

Mark Wagner, Rehovot, IL;

Assignee:

KLA—Tencor Corporation, Milpitas, CA (US);

Attorney:

Suiter Swantz pc llo

Primary Examiner:

Jamil Ahmed

Int. Cl.
CPC ...
G01B 11/14 (2006.01); G01B 11/27 (2006.01); G01N 21/95 (2006.01); G03F 7/20 (2006.01); G01N 21/21 (2006.01); G01N 21/31 (2006.01); G01N 21/41 (2006.01); G01N 21/47 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01); G01N 21/9501 (2013.01); G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70533 (2013.01); G03F 7/70616 (2013.01); G01N 21/211 (2013.01); G01N 21/31 (2013.01); G01N 21/41 (2013.01); G01N 21/4738 (2013.01); G01N 21/4788 (2013.01); G01N 21/6489 (2013.01); G01N 2021/213 (2013.01);
Abstract

A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

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