Inventors with similar research interests:
Location History:
- Zikhron Yacov, IL (1994)
- Zichron Yakov, IL (1998 - 1999)
- Yaakov, IL (2000)
- Zichron Ya'akov, IL (US) (2009)
- Zirchron Yaakov, IL (2012 - 2015)
- Zichron, IL (2005 - 2017)
- Zirchon Yaakov, IL (2009 - 2017)
- Ya'akov Zickron, IL (2020)
- Ya'akov Zichron, IL (2020)
- Zichron Yaakov, IL (2000 - 2021)
- Ya'akov, IL (2008 - 2024)
Company Filing History:
39 out of 641 
32 out of 1,787 
5 out of 31 
Years Active: 1994-2024
Title: Michael E Adel: Innovating Precision Metrology in Overlay Analysis
Introduction:
In the realm of precision metrology, Michael E Adel has made significant contributions in revolutionizing overlay analysis. With an impressive portfolio of 63 patents, Adel has played a key role in shaping the field of metrology target design, uncertainty error estimation, and verification methods. His work in analyzing the impact of stochastic behavior on metrology data has enabled advancements in measurement reliability and accuracy. Let's explore his latest patents, career highlights, collaborations, and the mark he has left on the industry.
Latest Patents:
Among Adel's recent achievements are two pioneering patents. The first one focuses on determining the impacts of stochastic behavior on overlay metrology data. This methodology provides insights into the uncertainty error of metrology metric values, considering stochastic noise factors like line edge roughness (LER). The derived minimal required dimensions of target elements enhance the design of metrology targets and improve the estimation of overlay, particularly when using more localized models.
The second patent deals with verification metrology targets and their design. Adel's approach utilizes OCD (Optical CD) data to estimate any discrepancy between a target model and the corresponding actual target on a wafer. By adjusting the metrology target design model based on this estimation, Adel's technique compensates for inaccuracies caused by production process variations. This method enhances the accuracy of metrology measurements and also facilitates better collaboration between manufacturers and metrology vendors.
Career Highlights:
Adel has amassed an impressive body of work throughout his career, with a focus on precision metrology and overlay analysis. Notably, he has worked for prominent companies such as KLA Corporation (formerly KLA-Tencor Technologies Corporation), where he honed his skills and made significant contributions. Adel's ability to envision novel solutions in the ever-evolving field of metrology has garnered recognition from industry experts and peers alike.
Collaborations:
Adel's collaborative efforts exemplify his commitment to driving innovation in the field. He has worked closely with esteemed colleagues such as Mark Ghinovker and Walter Dean Mieher. These collaborations have facilitated the exchange of knowledge and insights, resulting in cutting-edge advancements in metrology target designs and measurement methodologies.
Conclusion:
Michael E Adel's groundbreaking patents and valuable contributions to overlay metrology have solidified his position as a distinguished innovator in the field. His work has opened up new possibilities for accurate and reliable metrology measurements, bringing substantial benefits to the semiconductor industry. Adel's expertise and relentless pursuit of innovation continue to shape the future of precision metrology, making him a prominent figure in the industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.