The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Feb. 27, 2018
Kla-tencor Corporation, Milpitas, CA (US);
Evgeni Gurevich, Yokneam Illit, IL;
Michael E. Adel, Zichron Ya'akov, IL;
Roel Gronheid, Leuven, BE;
Yoel Feler, Haifa, IL;
Vladimir Levinski, Midgal HaEmek, IL;
Dana Klein, Haifa, IL;
Sharon Aharon, Hanaton, IL;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER). Minimal required dimensions of target elements may be derived from analysis of the line properties and uncertainty error of metrology measurements, by either CDSEM (critical dimension scanning electron microscopy) or optical systems, with corresponding targets. The importance of this analysis is emphasized in view of the finding that stochastic noise may have increased importance with when using more localized models such as CPE (correctables per exposure). The uncertainty error estimation may be used for target design, enhancement of overlay estimation and evaluation of measurement reliability in multiple contexts.