Company Filing History:
Years Active: 2020-2024
Title: Innovations by Sharon Aharon
Introduction
Sharon Aharon is a prominent inventor based in Hanaton, Illinois. She has made significant contributions to the field of metrology, particularly in the area of pattern placement error reduction. With a total of five patents to her name, Aharon has demonstrated her expertise and commitment to advancing technology.
Latest Patents
One of Aharon's latest patents focuses on the reduction or elimination of pattern placement error in metrology measurements. This patent provides methods and targets aimed at minimizing discrepancies between device pattern positions and target pattern positions. The innovation maintains target printability, process compatibility, and optical contrast in both imaging and scatterometry metrology. Aharon’s approach includes the use of sub-resolved assist features in mask design, which share the same periodicity as the periodic structure. Additionally, she emphasizes the importance of calibrating measurement results using pattern placement error correction factors derived from learning procedures applied to specific calibration terms. Her metrology targets incorporate multiple periodic structures at the same layer, which are essential for calibrating and removing pattern placement errors, especially in relation to asymmetric effects such as scanner aberrations and off-axis illumination.
Career Highlights
Throughout her career, Sharon Aharon has worked with notable companies, including KLA-Tencor Corporation and KLA Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to significant advancements in metrology technology.
Collaborations
Aharon has collaborated with esteemed colleagues, including Vladimir Levinski and Evgeni Gurevich. These partnerships have further enriched her work and expanded the impact of her innovations.
Conclusion
Sharon Aharon is a trailblazer in the field of metrology, with a focus on reducing pattern placement errors. Her innovative patents and collaborations highlight her dedication to advancing technology in this critical area.