Haifa, Israel

Dana Klein

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 28(Granted Patents)


Location History:

  • Migdal Ha'emek, IL (2016)
  • Milpitas, CA (US) (2022)
  • Haifa, IL (2015 - 2023)

Company Filing History:


Years Active: 2015-2023

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11 patents (USPTO):Explore Patents

Title: Dana Klein: Innovator in Metrology Optimization

Introduction

Dana Klein is a prominent inventor based in Haifa, Israel, known for her significant contributions to the field of metrology optimization. With a total of 11 patents to her name, she has developed innovative methods that enhance the accuracy and efficiency of semiconductor manufacturing processes.

Latest Patents

Among her latest patents is a groundbreaking invention titled "Systems and methods for metrology optimization based on metrology landscapes." This method quantifies the sensitivity of metrology to process variations by performing measurements on metrology targets located on semiconductor wafers. The invention generates a metrology landscape and calculates a sensitivity metric that quantifies how sensitive the metrology landscape is to variations in the manufacturing process. Another notable patent is the "Method and system for providing a quality metric for improved process control." This invention involves acquiring overlay metrology measurement signals from various targets across a wafer, determining overlay estimates, and generating quality metrics based on the distributions of these estimates.

Career Highlights

Dana has worked with notable companies in the semiconductor industry, including KLA-Tencor Corporation and KLA Corporation. Her experience in these organizations has allowed her to refine her expertise in metrology and process control, contributing to advancements in semiconductor technology.

Collaborations

Throughout her career, Dana has collaborated with talented individuals such as Tal Marciano and Guy Cohen, further enhancing her innovative work in the field.

Conclusion

Dana Klein's contributions to metrology optimization have made a significant impact on the semiconductor industry. Her innovative patents and collaborative efforts continue to drive advancements in manufacturing processes.

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