The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Apr. 04, 2012
Daniel Kandel, Aseret, IL;
Guy Cohen, Yaad, IL;
Dana Klein, Haifa, IL;
Vladimir Levinski, Nazareth Ilit, IL;
Noam Sapiens, Bat Yam, IL;
Alex Shulman, Migdal Haemek, IL;
Vladimir Kamenetsky, Migdal Haemek, IL;
Eran Amit, Migdal Haemek, IL;
Irina Vakshtein, Migdal Haemek, IL;
Daniel Kandel, Aseret, IL;
Guy Cohen, Yaad, IL;
Dana Klein, Haifa, IL;
Vladimir Levinski, Nazareth Ilit, IL;
Noam Sapiens, Bat Yam, IL;
Alex Shulman, Migdal Haemek, IL;
Vladimir Kamenetsky, Migdal Haemek, IL;
Eran Amit, Migdal Haemek, IL;
Irina Vakshtein, Migdal Haemek, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.