The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Jun. 25, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Dana Klein, Haifa, IL;

Tal Marciano, Yokneam lllit, IL;

Noa Armon, R.D. Misgav, IL;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/27 (2013.01); H01L 21/67288 (2013.01); H01L 22/12 (2013.01);
Abstract

A method for quantifying sensitivity of metrology to process variation including performing metrology, by a metrology tool, on at least one metrology target located at at least one site on a semiconductor wafer, thereby generating a metrology landscape, and calculating a sensitivity metric directly based on the metrology landscape, the sensitivity metric quantifying a sensitivity of the metrology landscape to process variation involved in manufacture of the semiconductor wafer.


Find Patent Forward Citations

Loading…