The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Oct. 07, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Dana Klein, Haifa, IL;

Sven Jug, Austin, TX (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/18 (2006.01); G03F 7/20 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G06F 17/18 (2013.01); G03F 7/70633 (2013.01); G05B 19/41875 (2013.01); Y02P 90/22 (2015.11);
Abstract

Methods and respective modules which reduce sample size and measurement duration of metrology parameters by selecting a relatively small subset of measured targets to represent a distribution of parameter measurements of a large number of targets. The subset is selected by sampling a substantially equal number of measurements from each of a selected number of quantiles of the distribution. The methods and modules allow identification of targets which represent correctly the whole target measurement distribution. The methods and modules optimize quantiles and sample size selections, using accuracy scores and estimations of the robustness of the selections. Sampling and selections may be carried out iteratively to reach specified criteria that match the results which can be derived when considering the whole distribution.


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