The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Nov. 01, 2016
Kla-tencor Corporation, Milpitas, CA (US);
Tal Marciano, Zychron Yaacov, IL;
Michael E. Adel, Zichron Ya'akov, IL;
Mark Ghinovker, Yoqneam Ilit, IL;
Barak Bringoltz, Rishon le Tzion, IL;
Dana Klein, Haifa, IL;
Tal Itzkovich, Kfar Uriya, IL;
Vidya Ramanathan, Clifton Park, NY (US);
Janay Camp, Ballston Spa, NY (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.