The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Jan. 10, 2018
Kla-tencor Corporation, Milpitas, CA (US);
Michael E. Adel, Ya'akov, IL;
Amnon Manassen, Haifa, IL;
William Pierson, Austin, TX (US);
Ady Levy, San Jose, CA (US);
Pradeep Subrahmanyan, Cupertino, CA (US);
Liran Yerushalmi, Zicron Yaacob, IL;
DongSub Choi, Yongin, KR;
Hoyoung Heo, Gyeonggi-do, KR;
Dror Alumot, Rehovot, IL;
John Charles Robinson, Austin, TX (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A process control system may include a controller configured to receive after-development inspection (ADI) data after a lithography step for the current layer from an ADI tool, receive after etch inspection (AEI) overlay data after an exposure step of the current layer from an AEI tool, train a non-zero offset predictor with ADI data and AEI overlay data to predict a non-zero offset from input ADI data, generate values of the control parameters of the lithography tool using ADI data and non-zero offsets generated by the non-zero offset predictor, and provide the values of the control parameters to the lithography tool for fabricating the current layer on the at least one production sample.