Jeng-Horng Chen

Title: Jeng-Horng Chen: Innovating Lithography Systems for Enhanced Semiconductor Manufacturing

Introduction:

In the world of semiconductor manufacturing, innovators like Jeng-Horng Chen play a crucial role in developing cutting-edge technologies and pushing the boundaries of lithography systems. Based in Hsin-Chu, Taiwan, Jeng-Horng Chen has made significant contributions to the field with numerous patents and has worked with leading companies in the industry, such as Taiwan Semiconductor Manufacturing Company (TSMC) and Haynes and Boone, Llp. In this article, we will explore Jeng-Horng Chen's latest patents, career highlights, and collaborations that highlight his expertise and impact in the semiconductor industry.

Latest Patents:

Jeng-Horng Chen's inventive nature is evident in his impressive portfolio of patents. Among his numerous patents, two recent examples stand out, revolutionizing lithography systems:

1. Mask Cleaning - This lithography system incorporates a unique design aimed at optimizing the cleaning process of masks used in semiconductor manufacturing. The system comprises a first load lock chamber to receive the mask, a cleaning module to clean the mask, a second load lock chamber to receive the wafer, and an exposure module to expose the wafer to a light source using the cleaned mask. Importantly, the first load lock chamber directly couples with the exposure module, bypassing the cleaning module and streamlining the overall operations.

2. Lithography System with an Embedded Cleaning Module This patent demonstrates Jeng-Horng Chen's ingenuity in integrating cleaning capabilities into a lithography system. The system features an exposing module that conducts the lithography exposing process using a mask secured on a mask stage. Additionally, a cleaning module is thoughtfully integrated into the exposing module and utilizes an attraction mechanism to clean either the mask or the mask stage. This innovation simplifies the manufacturing process and enhances efficiency.

Career Highlights:

Throughout his career, Jeng-Horng Chen has achieved remarkable milestones and earned recognition for his contributions. Notably, he has played a vital role in driving advancements in semiconductor manufacturing technology while working at Taiwan Semiconductor Manufacturing Company (TSMC), a global leader in semiconductor fabrication. His expertise and leadership have undoubtedly influenced TSMC's success in adopting innovative lithography systems.

Collaborations:

In the pursuit of innovation, collaborations often yield remarkable outcomes. Jeng-Horng Chen has had the privilege of working with notable industry professionals, including Anthony Yen and Shinn-Sheng Yu. These collaborations have allowed for dynamic exchanges of ideas and expertise, resulting in the development of groundbreaking technologies.

Conclusion:

Jeng-Horng Chen's passion for innovation and commitment to advancing semiconductor manufacturing technologies is evident in his extensive patent portfolio and successful collaborations. With his recent patents in optimizing mask cleaning and integrating cleaning modules into lithography systems, Jeng-Horng Chen continues to provide solutions that enhance efficiency and propel the industry forward. His contributions and expertise have undoubtedly played a significant role in the progression of semiconductor manufacturing, benefiting companies like TSMC and shaping the future of the industry.