The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Feb. 22, 2022
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Shu-Hao Chang, Taipei, TW;
Norman Chen, Hsinchu, TW;
Jeng-Horng Chen, Hsinchu, TW;
Kuo-Chang Kau, Yuanli Township, TW;
Ming-Chin Chien, Hsinchu, TW;
Shang-Chieh Chien, New Taipei, TW;
Anthony Yen, Hsinchu, TW;
Kevin Huang, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A lithography system includes a first load lock chamber configured to receive a mask, a cleaning module configured to clean the mask, a second load lock chamber configured to receive a wafer, an exposure module configured to expose the wafer to a light source through use of the cleaned mask. A direct path is provided between the first load lock chamber and the exposure module allowing the first load lock chamber to directly couple to the exposure module without through the cleaning module.