The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Apr. 04, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Amo Chen, Hsin-Chu, TW;

Yun-Yue Lin, Hsinchu County, TW;

Ta-Cheng Lien, Hsinchu County, TW;

Hsin-Chang Lee, Hsinchu County, TW;

Chih-Cheng Lin, Kaohsiung, TW;

Jeng-Horng Chen, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/62 (2012.01); G03F 1/64 (2012.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/22 (2013.01); G03F 1/62 (2013.01); G03F 7/20 (2013.01); H01L 21/0274 (2013.01);
Abstract

The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.


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