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For the Inventor, By the Inventor

Zhubei, Taiwan

Hsin-Chang Lee

This inventor holds 173 USPTO granted patents and 67 published patent applications, primarily in EUV Photomask Technology (CPC class G03F1-24). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsin-Chang Lee. Retrieved from https://idiyas.com/inventor/hsin-chang-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 173 

% Patents Active = 89.6

Average Co-Inventor Count = 4.6

ph-index = 8

Forward Citations = 888(Granted Patents)

Forward Citations (Not Self Cited) = 667(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Hsin-Chu Xian, TW (2010 - 2015)
  • Zhubei, Hsinchu County, TW (2017)
  • Zhubei, TW (2008 - 2024)
  • Hsinchu, TW (2011 - 2024)
  • Hsinchu County, TW (2016 - 2024)

Company Filing History:

goldMedal170 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal2 out of 465 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2008-2026

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Areas of Expertise:
EUV Photomask
Pellicle Membrane
Lithography
Photoresist
Carbon Nanotube
Mask Characterization
Plasma Treatment
Semiconductor Device
Optical Assembly
Particle Inspection
Nanotube Films
Critical Dimension Control
173 patents (USPTO):Explore Patents
1. 12663710 - Pellicle having vent hole (2026-06-23),
2. 12663709 - Pellicle and method of manufacturing thereof (2026-06-23),
3. 12656676 - Extreme ultraviolet mask and method of manufacturing the same (2026-06-16),
4. 12656671 - Method of manufacturing EUV photo masks (2026-06-16),
5. 12645138 - Multi-layer pellicle membrane (2026-06-02),
6. 12645136 - Extreme ultraviolet mask with capping layer (2026-06-02),
7. 12625425 - Lithography mask (2026-05-12),
8. 12619142 - Methods of manufacturing pellicle for EUV lithography masks (2026-05-05),
9. 12607923 - Mask and method for forming the same (2026-04-21),
10. 12578652 - Photomask and methods for measuring and manufacturing the photomask (2026-03-17),
11. 12578640 - Photosensitive material for photoresist and lithography (2026-03-17),
12. 12578270 - Mask characterization methods (2026-03-17),
13. 12557609 - Methods for dry printing carbon nanotube membranes (2026-02-17),
14. 12554191 - Pellicle membrane and method of forming the same (2026-02-17),
15. 12535740 - Interstitial type absorber for extreme ultraviolet mask (2026-01-27),

Title: The Innovative Journey of Hsin-Chang Lee

Introduction: Hsin-Chang Lee, a pioneering inventor hailing from Zhubei, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Lee's latest patents showcase his commitment to innovation, with a focus on developing cutting-edge solutions in the realm of electronics and telecommunications.

Career Highlights: Throughout his illustrious career, Lee has been at the forefront of technological advancements, holding numerous patents that have revolutionized industries. His expertise in research and development has led to the creation of products that have enhanced the way we live and work.

Collaborations: Lee has collaborated with leading tech companies and research institutions, pooling his knowledge and skills to drive forward progress in the field of innovation. His partnerships have resulted in the successful implementation of novel ideas and concepts.

Conclusion: Hsin-Chang Lee's dedication to innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of technology. His inventive spirit continues to inspire future generations of inventors and researchers to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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