Zhubei, Taiwan

Hsin-Chang Lee

USPTO Granted Patents = 155 

Average Co-Inventor Count = 4.5

ph-index = 8

Forward Citations = 855(Granted Patents)

Forward Citations (Not Self Cited) = 667(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hsin-Chu Xian, TW (2010 - 2015)
  • Zhubei, Hsinchu County, TW (2017)
  • Zhubei, TW (2008 - 2024)
  • Hsinchu, TW (2011 - 2024)
  • Hsinchu County, TW (2016 - 2024)

Company Filing History:


Years Active: 2008-2025

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Areas of Expertise:
Euv Photo Masks
Lithography
Pellicle Membrane
Semiconductor Manufacturing
Plasma Treatment
Particle Inspection
Mask Cleaning
Critical Dimension Control
Optical Assembly
Mask Blanks
Extreme Ultraviolet Technology
Photomask Fabrication
155 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hsin-Chang Lee

Introduction: Hsin-Chang Lee, a pioneering inventor hailing from Zhubei, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Lee's latest patents showcase his commitment to innovation, with a focus on developing cutting-edge solutions in the realm of electronics and telecommunications.

Career Highlights: Throughout his illustrious career, Lee has been at the forefront of technological advancements, holding numerous patents that have revolutionized industries. His expertise in research and development has led to the creation of products that have enhanced the way we live and work.

Collaborations: Lee has collaborated with leading tech companies and research institutions, pooling his knowledge and skills to drive forward progress in the field of innovation. His partnerships have resulted in the successful implementation of novel ideas and concepts.

Conclusion: Hsin-Chang Lee's dedication to innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of technology. His inventive spirit continues to inspire future generations of inventors and researchers to push the boundaries of what is possible.

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