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Taipei, Taiwan

Pei-Cheng Hsu

This inventor holds 91 USPTO granted patents and 49 published patent applications, primarily in EUV Lithography Masks (CPC class G03F1-24). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pei-Cheng Hsu. Retrieved from https://idiyas.com/inventor/pei-cheng-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 91 

% Patents Active = 95.6

Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 484(Granted Patents)

Forward Citations (Not Self Cited) = 395(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Taipei, TW (2014 - 2024)
  • Hsinchu, TW (2023 - 2024)
  • Hsinshu, TW (2024)

Company Filing History:

goldMedal88 out of 42,926 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal2 out of 491 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2014-2026

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Areas of Expertise:
EUV Mask
Photomask
Pellicle Membrane
Carbon Nanotubes
Optical Assembly
Critical Dimension Control
Lithography
Mask Fabrication
Alloy Absorbers
Catalyst Removal
Magnetic Material
Reticle Container
91 patents (USPTO):Explore Patents
1. 12761547 - Pellicle for EUV lithography masks and methods of manufacturing thereof (2026-10-13),
2. 12663710 - Pellicle having vent hole (2026-06-23),
3. 12663709 - Pellicle and method of manufacturing thereof (2026-06-23),
4. 12656671 - Method of manufacturing EUV photo masks (2026-06-16),
5. 12645138 - Multi-layer pellicle membrane (2026-06-02),
6. 12645136 - Extreme ultraviolet mask with capping layer (2026-06-02),
7. 12619142 - Methods of manufacturing pellicle for EUV lithography masks (2026-05-05),
8. 12607923 - Mask and method for forming the same (2026-04-21),
9. 12578652 - Photomask and methods for measuring and manufacturing the photomask (2026-03-17),
10. 12557609 - Methods for dry printing carbon nanotube membranes (2026-02-17),
11. 12554191 - Pellicle membrane and method of forming the same (2026-02-17),
12. 12535740 - Interstitial type absorber for extreme ultraviolet mask (2026-01-27),
13. 12523929 - Methods for removing catalyst particles from nanotube films (2026-01-13),
14. 12517424 - Methods to improve mechanical properties of pellicle membrane (2026-01-06),
15. 12517423 - Extreme ultraviolet mask with alloy based absorbers (2026-01-06),

Title: The Innovative Journey of Pei-Cheng Hsu

Introduction:

Pei-Cheng Hsu, a distinguished inventor hailing from Taipei, Taiwan, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents:

Pei-Cheng Hsu's latest patents showcase his expertise in developing cutting-edge solutions for various industries, ranging from electronics to healthcare. His commitment to pushing the boundaries of innovation is evident in his recent patent applications.

Career Highlights:

With a career spanning over two decades, Pei-Cheng Hsu has established himself as a visionary inventor with a keen eye for identifying gaps in the market and creating novel solutions. His journey is marked by a series of successful inventions that have revolutionized the way we approach technological challenges.

Collaborations:

Throughout his career, Pei-Cheng Hsu has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion:

In conclusion, Pei-Cheng Hsu's relentless pursuit of innovation and his passion for creating impactful solutions have solidified his position as a trailblazer in the world of technology. His contributions continue to inspire the next generation of inventors and shape the future of various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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