The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jun. 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Chue San Yoo, Hsinchu, TW;
Chih-Chiang Tu, Hsinchu, TW;
Chien-Cheng Chen, Hsinchu, TW;
Jong-Yuh Chang, Hsinchu, TW;
Kun-Lung Hsieh, Hsinchu, TW;
Pei-Cheng Hsu, Hsinchu, TW;
Hsin-Chang Lee, Hsinchu, TW;
Yun-Yue Lin, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A pellicle includes a frame having an attachment surface configured to attach to a photomask, wherein the frame comprises a vent hole. The pellicle further includes a filter covering the vent hole, wherein the filter directly contacts an inner surface of the frame, and the filter extends in a direction parallel to the attachment surface. The pellicle further includes a membrane extending over a top surface of the frame.