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For the Inventor, By the Inventor

Jhubei, Taiwan

Jong-Yuh Chang

This inventor holds 24 USPTO granted patents and 2 published patent applications, primarily in Extreme Ultraviolet Lithography. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong-Yuh Chang. Retrieved from https://idiyas.com/inventor/jong-yuh-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 58.3

Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Jhubei, TW (2014 - 2021)
  • Hsinchu County, TW (2018 - 2024)
  • Hsinchu, TW (2024)

Company Filing History:

goldMedal24 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2014-2026

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Areas of Expertise:
Pellicle
Extreme Ultraviolet Lithography
Mask Treatment
Gas Injectors
Defect Detection
Mask Inspection
Overlay Control
Graphene Pellicle
Contamination Inspection
Mask Film Scheme
24 patents (USPTO):Explore Patents
1. 12663710 - Pellicle having vent hole (2026-06-23),
2. 12013632 - Pellicle having vent hole (2024-06-18),
3. 11906897 - Method for extreme ultraviolet lithography mask treatment (2024-02-20),
4. 11143952 - Pellicle removal method (2021-10-12),
5. 11048158 - Method for extreme ultraviolet lithography mask treatment (2021-06-29),
6. 10859906 - Extreme ultraviolet alignment marks (2020-12-08),
7. 10345695 - Extreme ultraviolet alignment marks (2019-07-09),
8. 10157805 - Moveable and adjustable gas injectors for an etching chamber (2018-12-18),
9. 10156783 - Image mask film scheme and method (2018-12-18),
10. 10012899 - Graphene pellicle for extreme ultraviolet lithography (2018-07-03),
11. 9689805 - Systems and methods eliminating false defect detections (2017-06-27),
12. 9581894 - Image mask film scheme and method (2017-02-28),
13. 9529255 - Image process method to improve mask inspection performance (2016-12-27),
14. 9377701 - Mask overlay control (2016-06-28),
15. 9373551 - Moveable and adjustable gas injectors for an etching chamber (2016-06-21),

Title: Jong-Yuh Chang: Innovator from Jhubei

Introduction: Jong-Yuh Chang is a renowned inventor hailing from Jhubei, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jong-Yuh Chang holds several patents in the areas of electronics, semiconductor technology, and renewable energy, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Jong-Yuh Chang has worked with leading tech companies, research institutions, and universities, where he has played a pivotal role in developing cutting-edge technologies that have revolutionized the industry.

Collaborations: Throughout his career, Jong-Yuh Chang has collaborated with top inventors, patent attorneys, and research institutions globally, fostering a culture of innovation and knowledge sharing that has led to numerous breakthroughs in the tech sector.

Conclusion: Jong-Yuh Chang's passion for innovation, coupled with his relentless drive to create solutions for the future, solidifies his position as a trailblazer in the world of technology and a source of inspiration for aspiring inventors worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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