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For the Inventor, By the Inventor

Tauyen, Taiwan

Chih-Chiang Tu

USPTO Granted Patents = 72 

Average Co-Inventor Count = 3.2

ph-index = 9

Forward Citations = 334(Granted Patents)

DiyaCoin DiyaCoin = 0.48 


Inventors with similar research interests:


Location History:

  • Tauyan, TW (1998)
  • Tau-yeng, TW (1998)
  • Tan-yen, TW (1998)
  • Taoyuan, TW (2016 - 2022)
  • Hsin-Chu, TW (1999 - 2023)
  • Tau-yen, TW (1997 - 2024)
  • Hsinchu, TW (2024)

Company Filing History:

goldMedal72 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 1997-2024

where 'Filed Patents' based on already Granted Patents

72 patents (USPTO):
1. 12176211 - Reflection mode photomask (2024-12-24),
2. 12124163 - Mask defect prevention (2024-10-22),
3. 12066757 - Mask and method of forming the same (2024-08-20),
4. 12013632 - Pellicle having vent hole (2024-06-18),
5. 11860530 - Mask defect prevention (2024-01-02),
6. 11854861 - System and method for performing spin dry etching (2023-12-26),
7. 11735421 - Reflection mode photomask and method of making (2023-08-22),
8. 11662656 - Mask and method of forming the same (2023-05-30),
9. 11531263 - Photomask having a plurality of shielding layers (2022-12-20),
10. 11402743 - Mask defect prevention (2022-08-02),
11. 11270884 - Reflection mode photomask (2022-03-08),
12. 11262658 - Photomask, photolithography system and manufacturing process (2022-03-01),
13. 11143952 - Pellicle removal method (2021-10-12),
14. 11099476 - Photomask having a plurality of shielding layers (2021-08-24),
15. 11086211 - Masks and methods of forming the same (2021-08-10),

Title: The Innovative Mind of Chih-Chiang Tu

Introduction: Chih-Chiang Tu, based in Tauyen, Taiwan, is a prominent inventor with an impressive portfolio of 72 patents. His contributions to technology, particularly in the semiconductor industry, reflect his innovative spirit and expertise.

Latest Patents: Among his latest patents, two stand out: the "Reflection Mode Photomask" and "Mask Defect Prevention." The Reflection Mode Photomask introduces a multilayer structure over a substrate, featuring a plurality of absorber stacks made from tantalum oxynitride and tantalum silicon oxynitride. Each stack is equipped with an anti-reflective coating layer using materials like tantalum nitride. Meanwhile, the Mask Defect Prevention patent describes a photolithographic mask assembly that integrates a capping layer and an absorber layer, with a unique venting feature area designed to minimize defects during the photolithography process.

Career Highlights: Chih-Chiang Tu has made significant strides in his career at Taiwan Semiconductor Manufacturing Company Limited, one of the leading companies in the semiconductor industry. His innovative designs and patents have contributed greatly to advancements in photolithography techniques.

Collaborations: Throughout his career, Tu has collaborated with talented colleagues such as Chun-Lang Chen and Jong-Yuh Chang. These collaborations have helped foster a creative environment that leads to the development of cutting-edge technologies in the field.

Conclusion: Chih-Chiang Tu stands as a testament to the impact of dedication and innovation in the technology sector. His patents not only showcase his technical skills but also contribute to the excellence of Taiwan Semiconductor Manufacturing Company Limited in advancing semiconductor technology.

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