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For the Inventor, By the Inventor

Tauyen, Taiwan

Chih-Chiang Tu

This inventor holds 76 USPTO granted patents and 11 published patent applications, primarily in Photomask Technology (CPC class G03F). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 1997-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Chiang Tu. Retrieved from https://idiyas.com/inventor/chih-chiang-tu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 76 

% Patents Active = 73.7

Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 366(Granted Patents)

Forward Citations (Not Self Cited) = 311(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Tauyan, TW (1998)
  • Tau-yeng, TW (1998)
  • Tan-yen, TW (1998)
  • Taoyuan, TW (2016 - 2022)
  • Hsin-Chu, TW (1999 - 2023)
  • Tau-yen, TW (1997 - 2024)
  • Hsinchu, TW (2024)

Company Filing History:

goldMedal75 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal1 out of 465 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents

Years Active: 1997-2026

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Areas of Expertise:
Reflection Mode Photomask
Mask Defect Prevention
Pellicle
Photolithography
Extreme Ultraviolet Alignment Marks
Semiconductor Device
Image Mask Film
Graphene Pellicle
Spin Dry Etching
Mask Overlay Control
E-Beam Writing
Hotspot Detection
76 patents (USPTO):Explore Patents
1. 12663710 - Pellicle having vent hole (2026-06-23),
2. 12656677 - Systems and methods for actinic mask inspection and review in vacuum (2026-06-16),
3. 12645148 - Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation (2026-06-02),
4. 12532400 - EUV source with rotation crucible and laser and tin (SN) auto-filling method (2026-01-20),
5. 12176211 - Reflection mode photomask (2024-12-24),
6. 12124163 - Mask defect prevention (2024-10-22),
7. 12066757 - Mask and method of forming the same (2024-08-20),
8. 12013632 - Pellicle having vent hole (2024-06-18),
9. 11860530 - Mask defect prevention (2024-01-02),
10. 11854861 - System and method for performing spin dry etching (2023-12-26),
11. 11735421 - Reflection mode photomask and method of making (2023-08-22),
12. 11662656 - Mask and method of forming the same (2023-05-30),
13. 11531263 - Photomask having a plurality of shielding layers (2022-12-20),
14. 11402743 - Mask defect prevention (2022-08-02),
15. 11270884 - Reflection mode photomask (2022-03-08),

Title: The Innovative Mind of Chih-Chiang Tu

Introduction: Chih-Chiang Tu, based in Tauyen, Taiwan, is a prominent inventor with an impressive portfolio of 72 patents. His contributions to technology, particularly in the semiconductor industry, reflect his innovative spirit and expertise.

Latest Patents: Among his latest patents, two stand out: the "Reflection Mode Photomask" and "Mask Defect Prevention." The Reflection Mode Photomask introduces a multilayer structure over a substrate, featuring a plurality of absorber stacks made from tantalum oxynitride and tantalum silicon oxynitride. Each stack is equipped with an anti-reflective coating layer using materials like tantalum nitride. Meanwhile, the Mask Defect Prevention patent describes a photolithographic mask assembly that integrates a capping layer and an absorber layer, with a unique venting feature area designed to minimize defects during the photolithography process.

Career Highlights: Chih-Chiang Tu has made significant strides in his career at Taiwan Semiconductor Manufacturing Company Limited, one of the leading companies in the semiconductor industry. His innovative designs and patents have contributed greatly to advancements in photolithography techniques.

Collaborations: Throughout his career, Tu has collaborated with talented colleagues such as Chun-Lang Chen and Jong-Yuh Chang. These collaborations have helped foster a creative environment that leads to the development of cutting-edge technologies in the field.

Conclusion: Chih-Chiang Tu stands as a testament to the impact of dedication and innovation in the technology sector. His patents not only showcase his technical skills but also contribute to the excellence of Taiwan Semiconductor Manufacturing Company Limited in advancing semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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