The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Apr. 27, 2023
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Chih-Chiang Tu, Tauyen, TW;
Chun-Lang Chen, Tainan, TW;
Shih-Hao Yang, Tainan, TW;
Jheng-Yuan Chen, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/54 (2012.01); G03F 1/22 (2012.01); G03F 1/24 (2012.01); G03F 1/26 (2012.01); G03F 1/52 (2012.01); G03F 1/80 (2012.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/26 (2013.01); G03F 1/22 (2013.01); G03F 1/24 (2013.01); G03F 1/52 (2013.01); G03F 1/54 (2013.01); G03F 1/80 (2013.01); H01L 21/0337 (2013.01);
Abstract
A mask includes a reflective layer, an absorption layer and an absorption part. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective layer and the absorption layer, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.