Jheng-Yuan Chen

Title: Jheng-Yuan Chen: Innovator in Semiconductor Mask Technology

Introduction

Jheng-Yuan Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced mask designs. With a total of three patents to his name, Chen's work has had a notable impact on the industry.

Latest Patents

Chen's latest patents include innovative designs for masks used in semiconductor manufacturing. One of his patents describes a mask that consists of a reflective layer, an absorption layer, and an absorption part. The absorption layer is strategically placed over the reflective multilayer, while the absorption part is integrated within both the reflective layer and the absorption layer. Notably, the entire top surface of the absorption part is designed to be flush with the top surface of the absorption layer. Another patent outlines a mask that features a substrate, a reflective multilayer, an absorption layer, and an absorption part. In this design, the substrate includes a mask image region and a mask frame region, with the mask frame region containing a black border adjacent to the image region. Similar to the first patent, the absorption part is positioned within the reflective multilayer and the absorption layer, ensuring that its top surface aligns with that of the absorption layer.

Career Highlights

Jheng-Yuan Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves the development and refinement of mask technologies that are crucial for the production of high-performance semiconductor devices. His expertise and innovative approach have positioned him as a key player in his field.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues, including Chih-Chiang Tu and Chun-Lang Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jheng-Yuan Chen's contributions to semiconductor mask technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing. As he continues to advance the field, his work will undoubtedly influence future developments in technology.