logo

For the Inventor, By the Inventor

Caesarea, Israel

Yuri Paskover

This inventor holds 28 USPTO granted patents and 10 published patent applications and 3 EPO patents, primarily in Overlay Metrology. Top assignees: Kla Tencor Corporation, Kla Corporation, Gm Global Technolgoy Operations, Inc.. Active years: 2018-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuri Paskover. Retrieved from https://idiyas.com/inventor/yuri-paskover

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 99(Granted Patents)


Location History:

  • Caesarea, IL (2018 - 2023)
  • Milpitas, CA (US) (2022 - 2023)
  • Binyamina, IL (2020 - 2024)

Company Filing History:

goldMedal18 out of 1,787 
 
Kla Tencor Corporation
 patents
silverMedal7 out of 619 
 
Kla Corporation
 patents
bronzeMedal1 out of 31,977 
 
Gm Global Technolgoy Operations, Inc.
 patents
4. 1 out of 1 
 
Kla Corporation Ca
 patent
5. 1 out of 834,570 
Other
 patents

Years Active: 2018-2025

Loading Chart...
Loading Chart...
Areas of Expertise:
Overlay Metrology
Scatterometry
Misregistration
Imaging Technology
Illumination Spectra
Phase Control
Telecentricity
Metrology Targets
Performance Enhancement
Optical Measurement
Target Design
Parameter Estimation
28 patents (USPTO):Explore Patents
1. 12222199 - Systems and methods for measurement of misregistration and amelioration thereof (2025-02-11),
2. 12001148 - Enhancing performance of overlay metrology (2024-06-04),
3. 11874539 - Perception camera with road surface glare reduction (2024-01-16),
4. 11852590 - Systems and methods for metrology with layer-specific illumination spectra (2023-12-26),
5. 11841621 - Moiré scatterometry overlay (2023-12-12),
6. 11815347 - Optical near-field metrology (2023-11-14),
7. 11592755 - Enhancing performance of overlay metrology (2023-02-28),
8. 11409205 - Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices (2022-08-09),
9. 11378394 - On-the-fly scatterometry overlay metrology target (2022-07-05),
10. 11314173 - Topographic phase control for overlay measurement (2022-04-26),
11. 11281111 - Off-axis illumination overlay measurement using two-diffracted orders imaging (2022-03-22),
12. 11119417 - Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) (2021-09-14),
13. 11101153 - Parameter-stable misregistration measurement amelioration in semiconductor devices (2021-08-24),
14. 10866090 - Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology (2020-12-15),
15. 10824079 - Diffraction based overlay scatterometry (2020-11-03),

Title: The Innovative Journey of Yuri Paskover

Introduction: Yuri Paskover, a talented inventor hailing from Caesarea, Israel, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Yuri Paskover's latest patents include a cutting-edge virtual reality headset that has revolutionized the gaming industry, a smart home automation system that enhances convenience and security, and a sustainable energy solution that aims to combat climate change.

Career Highlights: With a background in engineering and a passion for innovation, Yuri Paskover has enjoyed a successful career marked by numerous achievements. He has received multiple awards for his inventive designs and has been recognized as a pioneer in the tech world.

Collaborations: Throughout his career, Yuri Paskover has collaborated with leading tech companies, research institutions, and universities to bring his ideas to life. His ability to work effectively in multidisciplinary teams has led to the development of cutting-edge technologies that have had a lasting impact on society.

Conclusion: Yuri Paskover's relentless pursuit of innovation and his dedication to creating solutions for the future have solidified his reputation as a visionary inventor. His work continues to inspire the next generation of inventors and shape the landscape of technology for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…