The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Dec. 14, 2018
Kla-tencor Corporation, Milpitas, CA (US);
Yoni Shalibo, Binyamina, IL;
Yuri Paskover, Binyamina, IL;
Vladimir Levinski, Migdal HaEmek, IL;
Amnon Manassen, Haifa, IL;
Shlomo Eisenbach, Migdal HaEmek, IL;
Gilad Laredo, Migdal HaEmek, IL;
Ariel Hildesheim, Migdal HaEmek, IL;
KLA-TENCOR CORPORATION, Milpitas, CA (US);
Abstract
Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a −1diffraction order and a 0diffraction order and a second measurement signal comprising a +1distraction order and a 0diffraction order, wherein the −1diffraction order of the first measurement signal and the +1diffraction order of the second measurement signal are diffracted at 180° to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0diffraction order may be split to yield components which interact with the −1and +1diffraction orders.