The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2022

Filed:

Dec. 11, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Yuri Paskover, Milpitas, CA (US);

Itay Gdor, Tel-Aviv, IL;

Yuval Lubashevksy, Milpitas, CA (US);

Vladimir Levinski, Nazareth Ilit, IL;

Alexander Volfman, Milpitas, CA (US);

Yoram Uziel, Milpitas, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01);
Abstract

A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.


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