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For the Inventor, By the Inventor

Misgav, Israel

Yoram Uziel

This inventor holds 45 USPTO granted patents and 5 published patent applications, primarily in Overlay Metrology. Top assignees: Applied Materials Israel Limited, Kla Corporation, Applied Materials, Inc.. Active years: 1991-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoram Uziel. Retrieved from https://idiyas.com/inventor/yoram-uziel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 45 

% Patents Active = 82.2

Average Co-Inventor Count = 4.3

ph-index = 10

Forward Citations = 401(Granted Patents)


Location History:

  • Kibutz Yodfat, IL (1995)
  • Mobile Post Misgav, IL (2005)
  • Post Misgav, IL (2004 - 2017)
  • Misgav, IL (2001 - 2022)
  • Milpitas, CA (US) (2022 - 2023)
  • Yodfat, IL (1991 - 2024)
  • Migdal Ha'emek, IL (2022 - 2024)

Company Filing History:

goldMedal21 out of 572 
 
Applied Materials Israel Limited
 patents
silverMedal14 out of 619 
 
Kla Corporation
 patents
bronzeMedal5 out of 14,454 
 
Applied Materials, Inc.
 patents
4. 2 out of 46 
 
Kla Instruments Corporation
 patents
5. 2 out of 9 
 
Oramir Semiconductor Equipment Ltd.
 patents
6. 1 out of 1,787 
 
Kla Tencor Corporation
 patents
7. 1 out of 1 
 
Yozmot Gfanot Initiative Center
 patent
where one patent can have more than one assignee

Years Active: 1991-2026

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Areas of Expertise:
Overlay Metrology
Semiconductor Devices
In-Situ Cleaning
Metrology Sampling
Patterned Photoresist
Charged Particle Beam
Scatterometry
Wafer Inspection
Substrate Positioning
Laser-Accelerated Fluid
Particle Removal
Sealed Chamber
45 patents (USPTO):Explore Patents
1. 12721111 - Mini environment instrumented wafer (2026-08-25),
2. 12379669 - Massive overlay metrology sampling with multiple measurement columns (2025-08-05),
3. 12370581 - In-situ process chamber chuck cleaning by cleaning substrate (2025-07-29),
4. 12131959 - Systems and methods for improved metrology for semiconductor device wafers (2024-10-29),
5. 12001148 - Enhancing performance of overlay metrology (2024-06-04),
6. 11967535 - On-product overlay targets (2024-04-23),
7. 11713959 - Overlay metrology using spectroscopic phase (2023-08-01),
8. 11644419 - Measurement of properties of patterned photoresist (2023-05-09),
9. 11638938 - In situ process chamber chuck cleaning by cleaning substrate (2023-05-02),
10. 11637030 - Multi-stage, multi-zone substrate positioning systems (2023-04-25),
11. 11607716 - Systems and methods for chuck cleaning (2023-03-21),
12. 11592755 - Enhancing performance of overlay metrology (2023-02-28),
13. 11409205 - Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices (2022-08-09),
14. 11378394 - On-the-fly scatterometry overlay metrology target (2022-07-05),
15. 11294164 - Integrated system and method (2022-04-05),

Title: The Innovative Mind of Yoram Uziel

Introduction: Yoram Uziel, a talented inventor hailing from Misgav, Israel, is known for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: Yoram Uziel's recent patents include cutting-edge designs in the field of renewable energy, advanced medical devices, and innovative consumer electronics.

Career Highlights: With a career spanning over two decades, Yoram Uziel has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing solutions that push the boundaries of what is possible.

Collaborations: Throughout his career, Yoram Uziel has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Yoram Uziel's passion for innovation and his relentless drive to create a positive impact on society through his inventions make him a true pioneer in the world of technology. His work continues to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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